Plasma Damage of Gate Oxide through the Interlayer Dielectric

Shuji Hirao; Tatsuo Sugiyama; Takehito Yoshida; Kousaku Yano; Noboru Nomura

doi:https://doi.org/10.7567/SSDM.1993.A-3-3

1993 International Conference on Solid State Devices and Materials

Aug 29, 1993 - Sep 1, 1993
Makuhari Messe, Chiba, Japan

[A-3-3] Plasma Damage of Gate Oxide through the Interlayer Dielectric

Shuji Hirao, Tatsuo Sugiyama, Takehito Yoshida, Kousaku Yano, Noboru Nomura (1.Semiconductor Research Center Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1993.A-3-3

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