The Japan Society of Applied Physics

[A-4-3] Characterization of Hot Electron Induced Interface States in LATID MOS Devices Using an Improved Charge Pumping Method

Steve S. Chung、J.-J. Yang、C.-H. Tang、P.-C. Chou (1.Department of Electronic Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.1993.A-4-3