Suppression of Interfacial Boron Accumulation and Defect Density in Molecular Beam Epitaxial Silicon

Chi Sheng; Dawei Gong; Xin Wei; Fang Lu; Qinhua Wang; Henghui Sun; Xun Wang

doi:https://doi.org/10.7567/SSDM.1993.PB-1-2

[PB-1-2] Suppression of Interfacial Boron Accumulation and Defect Density in Molecular Beam Epitaxial Silicon

Chi Sheng、Dawei Gong、Xin Wei、Fang Lu、Qinhua Wang、Henghui Sun、Xun Wang (1.Surface Physics Laboratory, Fudan University、2.Physics Department, Fudan University)

https://doi.org/10.7567/SSDM.1993.PB-1-2

1993 International Conference on Solid State Devices and Materials

[PB-1-2] Suppression of Interfacial Boron Accumulation and Defect Density in Molecular Beam Epitaxial Silicon