[PB-3-4] Elevated Polycide Source / Drain Shallow Junctions with Advanced Silicidation Processing and Al Plug / Collimated PVD-Ti/TiN/Ti / Polycide (APPOCIDE) Contact for Submicron CMOS

H. Kotaki, Y. Takegawa, S. Kakimoto, T. Fukushima, K. Mitsuhashi, J. Takagi Y. Okamoto, Y. Akagi (1.Central Research Laboratories, Research and Analysis Center, Sharp Corporation)

https://doi.org/10.7567/SSDM.1993.PB-3-4