[PB-3-4] Elevated Polycide Source / Drain Shallow Junctions with Advanced Silicidation Processing and Al Plug / Collimated PVD-Ti/TiN/Ti / Polycide (APPOCIDE) Contact for Submicron CMOS

H. Kotaki、Y. Takegawa、S. Kakimoto、T. Fukushima、K. Mitsuhashi、J. Takagi Y. Okamoto、Y. Akagi (1.Central Research Laboratories, Research and Analysis Center, Sharp Corporation)

https://doi.org/10.7567/SSDM.1993.PB-3-4