[PC-1-20] A Low Parasitic Capacitance Scheme by Thermally Stable Titanium Silicide Technology for High Speed CMOS

Takehito Yoshida、Shinichi Ogawa、Akio Miyajima、Kousaku Yano (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1993.PC-1-20