[PC-1-27] In Situ Chamber Cleaning Using Halogenated-Gas Plasmas Evaluated by Plasma-Parameter Extraction

K. Ino、I. Natori、A. Ichikawa、T. Ohmi (1.Department of Electronic Engineering, Tohoku University、2.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1993.PC-1-27