[PC-1-3] The Initial Growth Mechanism of LPCVD-Si3N4 on Si and SiO2

N. Inoue、M. Itoh、H. Tamura、M. Yoshimaru、M. Ino (1.VLSI Research and Development Center OKI Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1993.PC-1-3