Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire

Yasuo Wada; Tokuo Kure; Toshiyuki Yoshimura; Yoshimi Sudo; Takashi Kobayashi; Yasushi Goto; Seiichi Kondo

doi:https://doi.org/10.7567/SSDM.1993.PD-5-1

[PD-5-1] Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire

Yasuo Wada, Tokuo Kure, Toshiyuki Yoshimura, Yoshimi Sudo, Takashi Kobayashi, Yasushi Goto, Seiichi Kondo (1.Advanced Research Laboratory, Hitachi, Ltd., 2.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1993.PD-5-1

1993 International Conference on Solid State Devices and Materials

[PD-5-1] Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire