Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire

Yasuo Wada; Tokuo Kure; Toshiyuki Yoshimura; Yoshimi Sudo; Takashi Kobayashi; Yasushi Goto; Seiichi Kondo

doi:https://doi.org/10.7567/SSDM.1993.PD-5-1

[PD-5-1] Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire

Yasuo Wada、Tokuo Kure、Toshiyuki Yoshimura、Yoshimi Sudo、Takashi Kobayashi、Yasushi Goto、Seiichi Kondo (1.Advanced Research Laboratory, Hitachi, Ltd.、2.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1993.PD-5-1

1993 International Conference on Solid State Devices and Materials

[PD-5-1] Fabrication of Less Than a 10nm Wide Polycrystalline Silicon Nano Wire