The Japan Society of Applied Physics

[S-I-9-3] Hole Confinement in a Si/GeSi/Si Quantum Well on SIMOX

D. K. Nayak、J. C. S. Woo、J. S. Park、K. L. Wang、K. P. MacWilliams (1.Department of Electrical Engineering University of California、2.The Aerospace Corporation、3.Research Center for Advanced Science and Technology (RCAST), The University of Tokyo)

https://doi.org/10.7567/SSDM.1993.S-I-9-3