[S-IV-3] Electrical Characterization of RTN-Poly-Si/CVD-Ta2O5/CVD-TiN Stacked DRAM Capacitors

V. K. Mathews、G. S. Sandhu、N. Sandler、P. C. Fazan (1.Micron Semiconductor, Inc.、2.LAM Research Corporation)

https://doi.org/10.7567/SSDM.1993.S-IV-3