[S-IV-5] Highly Reliable Ultra-Thin Ta2O5 Capacitor Process Technology by Using O2-Plasma Annealing Below 400℃

Hiroshi Suzuki、Satoshi Kamiyama、Hirohito Watanabe、Akira Sakai、Akihiko Ishitani (1.Thin Film Process Development Laboratory ULSI Device Development Laboratories, NEC Corporation、2.Micro-electronics Research Laboratory, NEC Corporation)

https://doi.org/10.7567/SSDM.1993.S-IV-5