[A-12-1] Analysis of Isolation Degradation Induced by Interlayer Material in Capacitor Over Bit-Line (COB) DRAM Cell

H. Mori、K. Shibahara、K. Koyama、N. Kodama (1.ULSI Device Development Laboratories NEC Corporation)

https://doi.org/10.7567/SSDM.1994.A-12-1