A Novel Source-Side Injection Split-Gate Flash Cell Technology for High Density Low Voltage Applications

Yoshimitsu YAMAUCHI; Masanori YOSHIMI; Kiyosige OMORI; Shinji NITTA; Norio MIZUKOSHI; Katsunori SUZUKI

doi:https://doi.org/10.7567/SSDM.1994.A-12-3

[A-12-3] A Novel Source-Side Injection Split-Gate Flash Cell Technology for High Density Low Voltage Applications

Yoshimitsu YAMAUCHI、Masanori YOSHIMI、Kiyosige OMORI、Shinji NITTA、Norio MIZUKOSHI、Katsunori SUZUKI (1.1st Development Dept., VLSI Research Laboratory, Sharp Corporation)

https://doi.org/10.7567/SSDM.1994.A-12-3

1994 International Conference on Solid State Devices and Materials

[A-12-3] A Novel Source-Side Injection Split-Gate Flash Cell Technology for High Density Low Voltage Applications