The Japan Society of Applied Physics

[A-3-4] Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors

Mitsutoshi MIYASAKA、Tadakazu KOMATSU、Akemi SHIMODAIRA、Ichio YUDASAKA、Hiroyuki OHSHIMA (1.SEIKO EPSON CORPORATION Active Device Research Laboratory / Analysis Center)

https://doi.org/10.7567/SSDM.1994.A-3-4