Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors

Mitsutoshi MIYASAKA; Tadakazu KOMATSU; Akemi SHIMODAIRA; Ichio YUDASAKA; Hiroyuki OHSHIMA

doi:https://doi.org/10.7567/SSDM.1994.A-3-4

[A-3-4] Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors

Mitsutoshi MIYASAKA, Tadakazu KOMATSU, Akemi SHIMODAIRA, Ichio YUDASAKA, Hiroyuki OHSHIMA (1.SEIKO EPSON CORPORATION Active Device Research Laboratory / Analysis Center)

https://doi.org/10.7567/SSDM.1994.A-3-4

1994 International Conference on Solid State Devices and Materials

[A-3-4] Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors