Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors

Mitsutoshi MIYASAKA; Tadakazu KOMATSU; Akemi SHIMODAIRA; Ichio YUDASAKA; Hiroyuki OHSHIMA

doi:https://doi.org/10.7567/SSDM.1994.A-3-4

1994 International Conference on Solid State Devices and Materials

1994年8月23日〜 1994年8月26日
Pacifico Yokohama, Yokohama, Japan

[A-3-4] Application of As-Deposited Poly-Crystalline Silicon Films to Low Temperature CMOS Thin Film Transistors

Mitsutoshi MIYASAKA、Tadakazu KOMATSU、Akemi SHIMODAIRA、Ichio YUDASAKA、Hiroyuki OHSHIMA (1.SEIKO EPSON CORPORATION Active Device Research Laboratory / Analysis Center)

https://doi.org/10.7567/SSDM.1994.A-3-4

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