The Japan Society of Applied Physics

[A-5-2] Study on the Fundamental Electrical Properties of Ultra-Thin Oxides Grown by Low Temperature Microwave Plasma Afterglow Oxidation

P. C. Chen, Klaus Y. J. Hsu, J. Y. Lin, H. L. Hwang (1.Department of Electrical Engineering, National Tsing Hua University, 2.Department of Electrical Engineering, Chung Cheng Institute of Technology)

https://doi.org/10.7567/SSDM.1994.A-5-2