[C-11-3] Formation of Copper Interconnects by Reflow of Sputtered Copper Films

Kazuhide Abe、Yusuke Harada、Keiichi Hashimoto、Hiroshi Onoda (1.VLSI Research and Development Center, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.C-11-3