[D-1-1] Low-Resistance TiSi2 Formation by Controlling Si Surface Condition for Deep-Sub-Micron CMOS

Hitoshi Wakabayashi、Takeo Matsuki、Yukishige Saito、Tohru Mogami、Takemitsu Kunio (1.Microelectronics Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.1994.D-1-1