[D-1-3] Novel Oxygen Free Titanium Silicidation (OFS) Processing for Low Resistance and Thermally Stable SALICIDE in Deep Submicron Dual Gate CMOS

H. Kotaki, M. Nakano, S. Hayashida, Y. Takegawa, T. Matsuoka, Y. Mori S. Kakimoto, K. Mitsuhashi, J. Takagi (1.Central Research Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1994.D-1-3