[LD-18] ON-Current Stability of Poly-Si Thin Film Transistor with Si-rich Oxide as Intermetal Dielectric Film after Negative Bias Temperature Stress

Gug-Seon Choi、Jin-Ho Choi、Yoon-Jong Lee、Jong-Wan Nam、Sook-Rak Ma、Kyung-Sik Chang、Jong-Sub Yoon、Hee-Koo Yoon (1.Semiconductor R&D Lab. 1, Hyundai Electronics Industries Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.LD-18