The Japan Society of Applied Physics

[LD-20] A Novel Fabrication Method for Short Channel MOSFET's Using Self-Aligned Ultrashallow Junction Formation by Selective Si1-xGex CVD

Kinya GOTO, Junichi MUROTA, Fumitaka HONMA, Takashi MATSUURA, Yasuji SAWADA (1.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1994.LD-20