[PA-3-1] Low Temperature and Facet-Free Epitaxial Silicon Growth by Contamination-Restrained Load-Lock LPCVD System

Masayuki NAKANO、Hiroshi KOTAKI、Seizou KAKIMOTO、Katsunori MITSUHASHI、Junkou TAKAGI (1.Central Research Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1994.PA-3-1