[S-I-8-3] Direct Patterning of the Current Confinement Structure for p-Type Column-III Nitrides by Low-Energy Electron Beam Irradiation Treatment

M. Inamori、H. Sakai、T. Tanaka、H. Amano、I. Akasaki (1.Department of Electrical and Electronic Engineering, Meijo University、2.Devices and Materials Department, Pioneer Electronic Corporation)

https://doi.org/10.7567/SSDM.1994.S-I-8-3