[B-3-5] Tungsten Gate Technology for Quarter-Micron Application

Hiromasa NODA、Hideyuki SAKIYAMA、Yasushi GOTO、Tokuo KURE、Shin'ichiro KIMURA (1.Semiconductor & Integrated Circuits Div., Hitachi, Ltd.、2.Central Research Laboratory, Hitachi, Ltd.、3.Hitachi VLSI Engineering Corp.)

https://doi.org/10.7567/SSDM.1995.B-3-5