[C-1-1] Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen

Yuka HAYAMI, Miki T. SUZUKI, Yoshiko OKUI, Hiroki OGAWA, Shuzo FUJIMURA (1.Process Development Division, C850, FUJITSU LIMITED)

https://doi.org/10.7567/SSDM.1995.C-1-1