Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment

Jun KIKUCHI; Mitsuaki NAGASAKA; Shuzo FUJIMURA; Hiroshi YANO; Yasuhiro HORIIKE

doi:https://doi.org/10.7567/SSDM.1995.C-1-2

[C-1-2] Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment

Jun KIKUCHI、Mitsuaki NAGASAKA、Shuzo FUJIMURA、Hiroshi YANO、Yasuhiro HORIIKE (1.Manufacturing Technology Division, FUJITSU LIMITED、2.Process Development Division, FUJITSU LIMITED、3.Electrical & Electronics Engineering, Toyo University)

https://doi.org/10.7567/SSDM.1995.C-1-2

1995 International Conference on Solid State Devices and Materials

[C-1-2] Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment