Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment

Jun KIKUCHI; Mitsuaki NAGASAKA; Shuzo FUJIMURA; Hiroshi YANO; Yasuhiro HORIIKE

doi:https://doi.org/10.7567/SSDM.1995.C-1-2

[C-1-2] Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment

Jun KIKUCHI, Mitsuaki NAGASAKA, Shuzo FUJIMURA, Hiroshi YANO, Yasuhiro HORIIKE (1.Manufacturing Technology Division, FUJITSU LIMITED, 2.Process Development Division, FUJITSU LIMITED, 3.Electrical & Electronics Engineering, Toyo University)

https://doi.org/10.7567/SSDM.1995.C-1-2

1995 International Conference on Solid State Devices and Materials

[C-1-2] Cleaning of Silicon Surfaces by NF3 Added Hydrogen and Water Vapor Plasma Downstream Treatment