[C-1-3] Study of Cu Contamination Removal Using Electrolytic Ionized Water

H. Aoki, S. Yamasaki, Y. Shiramizu, N. Aoto, T. Imaoka, T. Futatsuki, Y. Yamasita, K. Yamanaka (1.ULSI Device Development Laboratories, NEC Corporation, 2.Central Laboratories, ORGANO Corporation)

https://doi.org/10.7567/SSDM.1995.C-1-3