[C-1-3] Study of Cu Contamination Removal Using Electrolytic Ionized Water

H. Aoki、S. Yamasaki、Y. Shiramizu、N. Aoto、T. Imaoka、T. Futatsuki、Y. Yamasita、K. Yamanaka (1.ULSI Device Development Laboratories, NEC Corporation、2.Central Laboratories, ORGANO Corporation)

https://doi.org/10.7567/SSDM.1995.C-1-3