[C-2-5] Characteristics of Boron Diffusion from BSG Film and the Formation of Ultra-Shallow, Low-Resistance Junctions

Hiroshi KUJIRAI、Eiichi MURAKAMI、Shin'ichiro KIMURA (1.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1995.C-2-5