[C-5-4] X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment

Yoshihiro SUGITA, Naoki AWAJI, Satoshi OHKUBO, Satoru WATANABE, Satoshi KOMIYA, Takashi ITO (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1995.C-5-4