[C-5-4] X-Ray Reflectometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment

Yoshihiro SUGITA、Naoki AWAJI、Satoshi OHKUBO、Satoru WATANABE、Satoshi KOMIYA、Takashi ITO (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1995.C-5-4