[C-6-5] The Control of Sidelobe Intensity with Arrangement of the Chrome Pattern (COSAC) in Halt-Tone Phase-Shifting Mask

S. Kobayashi、N. Oka、K. Watanabe、M. Inoue、K. Sakiyama (1.VLSI Development Laboratories, Tenri IC Group, Sharp Corporation)

https://doi.org/10.7567/SSDM.1995.C-6-5