[LB-L3] Deposition and Characterization of Fluorine Doped SiO2 Films Using Atmospheric Pressure Organosilane/O3 Chemistry

Y. NISHIMOTO, Y. YUYAMA, N. TOKUMASU, K. MAEDA (1.Semiconductor Process Laboratory Co., Ltd.)

https://doi.org/10.7567/SSDM.1995.LB-L3