[LB-L3] Deposition and Characterization of Fluorine Doped SiO2 Films Using Atmospheric Pressure Organosilane/O3 Chemistry

Y. NISHIMOTO、Y. YUYAMA、N. TOKUMASU、K. MAEDA (1.Semiconductor Process Laboratory Co., Ltd.)

https://doi.org/10.7567/SSDM.1995.LB-L3