[PA-1-3] Growth Kinetics of Ultrathin Silicon Dioxide Films Formed by Rapid Thermal Oxidation

Hisashi FUKUDA、Katsunori AKASE、Toshiaki ENDOH、Shigeru NOMURA (1.Department of Electrical and Electronic Engineering, Faculty of Engineering, Muroran Institute of Technology)

https://doi.org/10.7567/SSDM.1995.PA-1-3