[PA-1-8] Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film

Kenji ISHIKAWA、Hiroki OGAWA、Sumiko OSHIDA、Kaina SUZUKI、Shuzo FUJIMURA (1.Process development division C850, Fujitsu Limited)

https://doi.org/10.7567/SSDM.1995.PA-1-8