[PA-1-8] Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film
Kenji ISHIKAWA, Hiroki OGAWA, Sumiko OSHIDA, Kaina SUZUKI, Shuzo FUJIMURA
(1.Process development division C850, Fujitsu Limited)
https://doi.org/10.7567/SSDM.1995.PA-1-8