[PC-1-1] Formation Process of Highly Reliable Ultra-Thin Gate Oxide

K. Ohmi, T. Iwamoto, T. Yabune, T. Miyake, T. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University, 2.Laboratory for Electronic Intelligent Systems, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1995.PC-1-1