[PC-1-1] Formation Process of Highly Reliable Ultra-Thin Gate Oxide

K. Ohmi、T. Iwamoto、T. Yabune、T. Miyake、T. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University、2.Laboratory for Electronic Intelligent Systems, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1995.PC-1-1