[PC-10-6] Comparison of Standard and Low-Dose SIMOX Substrates for 0.15μm SOI MOSFET Applications

Hans-Oliver JOACHIM、Yasuo YAMAGUCHI、Takeshi FUJINO、Takaaki KATO、Yasuo INOUE、Tadashi HIRAO (1.ULSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1995.PC-10-6