Bi4Ti3O12 Films Grown on SiO2/Si at Low Temperature by Laser Ablation Method

Wenbiao WU; Keigo FUMOTO; Yoshihiro OISHI; Masanori OKUYAMA; Yoshihiro HAMAKAWA

doi:https://doi.org/10.7567/SSDM.1995.PC-2-4

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜 1995年8月24日
International House, Osaka, Japan

[PC-2-4] Bi4Ti3O12 Films Grown on SiO2/Si at Low Temperature by Laser Ablation Method

Wenbiao WU、Keigo FUMOTO、Yoshihiro OISHI、Masanori OKUYAMA、Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1995.PC-2-4

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