[PC-3-1] Suppression of Resistance Increase in Al/W Interconnects by N2 Plasma Treatment

Mitsuru Sekiguchi、Toyokazu Fujii、Michinari Yamanaka (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.、2.Kyoto Research Laboratory, Matsushita Electronics Co.)

https://doi.org/10.7567/SSDM.1995.PC-3-1