[PC-3-2] An Efficient Improvement for Barrier Effect of W-Filled Contact

Wen-Kuan Yeh、Ting-Chang Chang、Ming-Hsing Tsai、Sheng-Hsiung Chen、Kuang-Yang Chan、Mao-Chich Chen Mou-Shiung Lin (1.Department of Electronics Engineering, National Chiao Tung University and National Nano Device Laboratory, 1001 University Rd.、2.Taiwan Semiconductor Manufacturing Company)

https://doi.org/10.7567/SSDM.1995.PC-3-2