[PC-5-4] Low Dielectric Constant Fluorinated Oxide Films Prepared by Remote Plasma Chemical Vapor Deposition

Seung Min LEE、Min PARK、Kyu Chang PARK、Jong Tae BAEK、Jin JANG (1.Department of Physics, Kyung Hee University、2.Semiconductor Division, Electronics and Telecommunications Research Institute)

https://doi.org/10.7567/SSDM.1995.PC-5-4