[PC-5-5] Densified SiOF Film Formation for Preventing Water Absorption

Hiroshi KUDO、Rika SHINOHARA、Shunsaku TAKEISHI、Naoki AWAJI、Masao YAMADA (1.Thin Film Technology Dept., Process Dev. Div., Fujitsu LTD.、2.Electron Devices and Materials Lab., Fujitsu Lab., LTD.)

https://doi.org/10.7567/SSDM.1995.PC-5-5