[PC-6-2] The Cleaning of Particle and Metallic Impurity on Si Wafer Surface by Fluorine Etchant

H. Izumi, M. Nose, S. Ojima, K. Kubo, T. Ohmi (1.Department of Electronics, Faculty of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.1995.PC-6-2